List of instruments available in the lab


Fabrication systems:
- Multisource Vacuum deposition system with substrate temperature control and quartz crystal thickness monitor
- Double source Vacuum deposition system with substrate temperature control and quartz crystal thickness monitor
- Double source Vacuum deposition system with quartz crystal thickness monitor
- Radio frequency magnetron sputtering system with three targets, substrate temperature control and quartz crystal thickness monitor
- Pulsed Electron Deposition system with substrate temperature control and quartz crystal thickness monitor
- Controlled atmosphere/vacuum annealing treatment system (with turbomolecular pump, partial pressure monitor).
- Chemical Bath Deposition system
- Furnace
Characterisation systems:
- I-V measurement system with temperature control
- Solar simulator (AM1.5 and AM1.0)
- Impedance spectroscopy system (capacitance-voltage, drive level capacitance profiling, admittance spectroscopy) with N2-cryostat
- Zeiss computer controlled high resolution optical microscope with digital camera.
- NT-MDT Atomic Force Microscopes (two different systems)
- Semiconductor Prober with microscope
- Accelerated lifetime stability test system