Equipment

List of instruments available in the lab

Fabrication systems:

  • Multisource Vacuum deposition system with substrate temperature control and quartz crystal thickness monitor
  • Double source Vacuum deposition system with substrate temperature control and quartz crystal thickness monitor
  • Double source Vacuum deposition system with quartz crystal thickness monitor
  • Radio frequency magnetron sputtering system with three targets, substrate temperature control and quartz crystal thickness monitor
  • Pulsed Electron Deposition system with substrate temperature control and quartz crystal thickness monitor
  • Controlled atmosphere/vacuum annealing treatment system (with turbomolecular pump, partial pressure monitor).
  • Chemical Bath Deposition system
  • Furnace

Characterisation systems:

  • I-V measurement system with temperature control
  • Solar simulator (AM1.5 and AM1.0)
  • Impedance spectroscopy system (capacitance-voltage, drive level capacitance profiling, admittance spectroscopy) with N2-cryostat
  • Zeiss computer controlled high resolution optical microscope with digital camera.
  • NT-MDT Atomic Force Microscopes (two different systems)
  • Semiconductor Prober with microscope
  • Accelerated lifetime stability test system