• Multisource Vacuum deposition system with substrate temperature control and quartz crystal thickness monitor
• Double source Vacuum deposition system with substrate temperature control and quartz crystal thickness monitor
• Double source Vacuum deposition system with quartz crystal thickness monitor

• Radio frequency magnetron sputtering system with three targets, substrate temperature control and quartz crystal thickness monitor

• Pulsed Electron Deposition system with substrate temperature control and quartz crystal thickness monitor
• Controlled atmosphere/vacuum annealing treatment system (with turbomolecular pump, partial pressure monitor).
• Chemical Bath Deposition system
• Furnace

Characterisation systems:

• I-V measurement system with temperature control
• Solar simulator (AM1.5 and AM1.0)

• Impedance spectroscopy system (capacitance-voltage, drive level capacitance profiling, admittance spectroscopy) with N2-cryostat
• Zeiss computer controlled high resolution optical microscope with digital camera.
• NT-MDT Atomic Force Microscopes (two different systems)
• Semiconductor Prober with microscope
• Accelerated lifetime stability test system